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Development and functionalization of diamond thin films

The development of diamond thin films is carried out by chemical vapour deposition assisted by micro-wave plasma.
Depending on the synthesis conditions and on the nature of the substrates, it is possible to control their microstructure (microcrystalline, polycrystalline, textured, epitaxied films) and to a certain extent to limit the intrinsic defects of this kind of coating.

<font size="1"><i>Epitaxied film <001> on Si(001)</font></i>
<font size="1"><i>Textured film <111> on Si(001)</font></i>
<font size="1"><i>Textured film <001> on Si(001)</i></font>


Two types of functionalization are currently envisaged using such diamond thin films:

- the creation of nano-porous membranes that are impossible to obtain using RIE techniques, for applications as molecular biological filters or as inert supports of polymer electrolytes, for example in fuel cells,

- the production of diamond/nanotube composites for electrochemical applications.

<i>CVD nano-porous diamond film</i>
<i>Carbon on diamond CVD Nanowires </i>


Nano-etching is obtained by an interaction between the diamond crystalline surfaces and the transition metal nano-drops, where the formation conditions allow the etching speed and nano-trench size to be adjusted.
In slightly different conditions, the metal nano-drops allow the synthesis of carbon nanowires (Carbon NanoTube CNT, Diamond NanoWires DNW), either half-buried or at the surface of the diamond.
The physical, chemical and structural properties of these elements are now being studied.