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Development of functional thin films

The Development of functional thin films group develops materials in thin film form with novel functionalities for applications in:

  • Thermochromism

  • Plasmonics and  transparent conductors

  • Nanostructuration of nitrides, optoelectronic properties

  • Diamond thin-layer based devices

  • Energy conversion

http://ijl.univ-lorraine.fr/fileadmin/Redacteurs/CP2S/EFCM/images-202/Image_202web.jpg

The group has a long and recognized experience in film depositing and characterizing techniques. Material films of thickness ranging from the nm to the µm scale can be prepared on any material: metallic alloys, ceramic and polymer substrates thanks to low temperature plasma processing techniques.


We possess a unique panel of depositing techniques:

  • Chemical vapour deposition

  • Reactive magnetron sputtering

  • MBE

  • Arc evaporation.

 

We also master well characterizing techniques: XRD, TEM, SEM, Raman, Mössbauer spectroscopies, etc.

 

The design of the nanostructure of the films, assisted by our capacity to design and build new prototype deposition chambers allows seeking experimental conditions to get films with desired physical properties.

 

The group is spread over two of the Institut Jean Lamour sites:the Artem campus in Nancy and the Faculty of Science and Technology in Vandœuvre-lès-Nancy.

It is composed of 2 researchers and 8 university lecturers. It currently hosts 8 PhD students and

3 post-doctoral fellows.

Group leader : Silvère BARRAT