Deposition systems
- 1 DC sputtering reactor with 2 magnetron cathodes
- 1 high temperature DC sputtering reactor with 2 magnetron cathodes
- 1 HIPIMS sputtering reactor with 3 magnetron cathodes
- 1 cathodic arc evaporation chamber
- 1 CVD reactor assisted by micro-wave plasma
- 1 mixed reactor equipped with 3 magnetron sources and 3 evaporation sources
- 3 reactive sputtering chambers connected to the Daμm equipment, including 1 semi-industrial reactor (homogeneity zone of about 600 cm²)
Characterization materials
- 1 Cary 5000 UV-visible-NIR spectrophotometer working in reflexion and transmission mode from liquid nitrogen to 600 °C
- 1 Fourier transform infrared spectrophotometer (50 to 4000 cm-1) working from liquid nitrogen to 600 °C
- 2 four point probe equipments
- 1 multi-wavelength Raman spectrometer
- 1 visible UHV in situ ellipsometer
- 1 UV-visible-PIR ex situ ellipsometer with Linkam cell