Equipment

Deposition systems

• 1 RF sputtering reactor

• 1 DC sputtering reactor with 2 magnetron cathodes

• 1 high temperature DC sputtering reactor with 2 magnetron cathodes

• 1 HIPIMS sputtering reactor with 3 magnetron cathodes

• 1 cathodic arc evaporation chamber

• 1 CVD reactor assisted by micro-wave plasma

• 1 mixed reactor equipped with 3 magnetron sources and 3 evaporation sources

• 3 reactive sputtering chambers connected to the Daμm equipment, including 1 semi-industrial reactor (homogeneity zone of about 600 cm²)
  
  

Characterization materials

• 1 Cary 5000 UV-visible-NIR spectrophotometer working in reflexion and transmission mode from liquid nitrogen to 600 °C

• 1 Fourier transform infrared spectrophotometer (50 to 4000 cm-1) working from liquid nitrogen to 600 °C

• 2 four point probe equipments

• 1 Hall effect

• 1 multi-wavelength Raman spectrometer

• 1 RHEED

• 1 visible UHV in situ ellipsometer

• 1 UV-visible-PIR ex situ ellipsometer with Linkam cell