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Equipment

Deposition systems

  • 1 RF sputtering reactor
  • 1 DC sputtering reactor with 2 magnetron cathodes
  • 1 high temperature DC sputtering reactor with 2 magnetron cathodes
  • 1 HIPIMS sputtering reactor with 3 magnetron cathodes
  • 1 cathodic arc evaporation chamber
  • 1 CVD reactor assisted by micro-wave plasma
  • 1 mixed reactor equipped with 3 magnetron sources and 3 evaporation sources
  • 3 reactive sputtering chambers connected to the Daμm equipment, including 1 semi-industrial reactor (homogeneity zone of about 600 cm²)

Characterization materials

  • 1 Cary 5000 UV-visible-NIR spectrophotometer working in reflexion and transmission mode from liquid nitrogen to 600 °C
  • 1 Fourier transform infrared spectrophotometer (50 to 4000 cm-1) working from liquid nitrogen to 600 °C
  • 2 four point probe equipments
  • 1 Hall effect
  • 1 multi-wavelength Raman spectrometer
  • 1 RHEED
  • 1 visible UHV in situ ellipsometer
  • 1 UV-visible-PIR ex situ ellipsometer with Linkam cell