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Plasmonics

Transparent semi-conducting thin films

 

The development of transparent microelectronics requires the optimization of conducting transparent films for the creation of junctions and devices. The group is interested in the synthesis and detailed characterization of transparent conducting oxide films dedicated to various electro-optical systems and hosts of plasmonic structures.

We use different methods for physical deposit in the vapour phase (reactive magnetron sputtering, HiPIMS and evaporation by filtered cathode arc) for the synthesis of oxide thin films with controlled electronic conductivity and optical property.
Particular interest is devoted to the analysis of the activation of doping elements by spectroscopical methods, as well as to the influence of synthesis conditions on the microstructural characteristics (for example, epitaxy at low temperature) and on the effects of quantum confinement.

<font size="1"><i>Nano-composites and plasmonics</font></i>

The conduction electrons of metallic nanoparticles (Cu, Au, Ag, etc.) placed in a dielectric medium can oscillate in a collective manner by resonance with an optical radiation of the appropriate frequency.
This phenomenon is called localized surface plasmon resonance (LSPR). It is at the origin of the current emergence of many applications in the domains of telecommunications, energy and biology. We focus on the interaction of noble metal particles with dielectrics of the oxide type within nanocomposite thin films of controlled morphology.
This approach allowed us to propose systems that present the LSPR phenomenon over wide ranges of temperature. In particular, we study the influence of the development of parameters on local physico-chemical characteristics at the atomic scale, to explain and control the resulting functional properties (optical, catalytic, electronic).