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Production scientifique

Année(s):

Toutes :: 2007, 2008, 2009, 2010, ... , 2012

Articles:
	M. Grafouté, C. Petitjean, C. Rousselot, J.F. Pierson et J.M. Grenèche Chemical environment of iron atoms in iron oxynitride films synthesised by reactive magnetron sputtering Scripta Materialia, 56:153-156 Annee 2007 Equipe: Département CP2S : EFCM
	V. Brien, P. Miska, B. Bolle et P. Pigeat Columnar growth of AlN films prepared by r.f. magnetron sputtering : role of the 103 planes Journal of crystal growth, 307(1):245-252 Annee 2007 Equipe: Département CP2S : EFCM
	D. Horwat et A. Billard Effects of substrate position and oxygen gas flow rate on the properties of ZnO: Al films prepared by reactive co-sputtering Thin Solid Films, 515:5444-5448 Annee 2007 Equipe: Département CP2S : EFCM
	J.F. Pierson, E. Duverger et O. Banakh Experimental and theoretical contributions to the determination of optical properties of synthetic paramelaconite Journal of Solid State Chemistry, 180:968-973 Annee 2007 Equipe: Département CP2S : EFCM
	T. Easwarakhanthan, D. Beyssen, L. Le Brizoual et P. Alnot Forouhi-Bloomer and Tauc-Lorentz optical dispersions applied using spectroscopic ellipsometry to plasma-deposited fluorocarbon films Journal of Applied Physics, 101:073102 Annee 2007 Equipe: Département CP2S : EFCM
	E BAUER-GROSSE et A AOUNI Glass-forming range and glass thermal stability in binary 3d TM-C systems Journal of Non-Crystalline Solids, 353:3644–3649 Annee 2007 Equipe: Département CP2S : EFCM
	A.-S Dehlinger, F. Lapostolle, S. Lamy, O. Rapaud, C. Meunier, V. Brien, D. Klein et C. Coddet Influence of Cr and Si addition on structural and mechanical properties of TiAlN coatings reactively sputter deposited Plasma processes and Polymers, 4:S588-S592 Annee 2007 Equipe: Département CP2S : EFCM
	D MERCS, P BRIOIS, V DEMANGE, S LAMY et C CODDET Influence of the addition of silicon on the structure and properties of chromium nitride coatings deposited by reactive magnetron sputtering assisted by RF plasmas Surface and Coatings Technology, 201:6970-6976 Annee 2007 Equipe: Département CP2S : EFCM
	J.F. Pierson et D. Horwat Influence of the current applied to the silver target on the structure and the properties of Ag-Cu-O films deposited by reactive cosputtering Applied Surface Science, 253:7522-7526 Annee 2007 Equipe: Département CP2S : EFCM
	D. Horwat, J.F. Pierson et A. Billard Magnetron sputtering of NASICON (Na3Zr2Si2PO12) thin films. Part I: limitations of the classical methods Surface and Coatings Technology, 201:7013-7017 Annee 2007 Equipe: Département CP2S : EFCM
	D. Horwat, J.F. Pierson et A. Billard Magnetron sputtering of NASICON (Na3Zr2Si2PO12) thin films. Part II: a novel approach Surface and Coatings Technology, 201:7060-7065 Annee 2007 Equipe: Département CP2S : EFCM
	V. Brien et P. Pigeat Microstructures diagram of magnetron sputtered AlN deposits : amorphous and nanostructured films Journal of crystal growth, 299:189-194 Annee 2007 Equipe: Département CP2S : EFCM
	A GUISE, S BARRAT et E BAUER-GROSSE Quantitative study of epitaxial CVD diamond deposit: correlations between nucleation parameters and experimental conditions Diamond and Related Materials, 16:695-700 Annee 2007 Equipe: Département CP2S : EFCM
	F. Bénédic, P. Bruno et P. Pigeat. Real-time optical monitoring of thin film growth by /in-situ/ pyrometry through multiple layers and effective media approximation modeling. Applied Phys. Letters, 90:134104 Annee 2007 Equipe: Département CP2S : EFCM
	E AUBRY, M.N GHAZZAL, V DEMANGE, N. CHAOUI, D. ROBERT et A. Billard Sodium poisining prevention of TiO2 photocatalyst coatings sputtered on soda-lime glass by intercalation of SiNx diffusion barriers Surface and Coatings Technology, 201:7706-7712 Annee 2007 Equipe: Département CP2S : EFCM
	P BRIOIS, F LAPOSTOLLE, V DEMANGE, E DJURADO et A BILLARD Structural investigations of YSZ coatings prepared by DC magnetron sputtering Surface and Coatings Technology, 201:6012-6018 Annee 2007 Equipe: Département CP2S : EFCM
	M. Grafouté, C. Petitjean, C. Rousselot, J.F. Pierson et J.M. Grenèche Structural properties of iron oxynitride films obtained by reactive magnetron sputtering Journal of Physics: Condensed Matter, 19:226207 Annee 2007 Equipe: Département CP2S : EFCM
	P. Kouakou, V. Brien, M. B. Assouar, V. Hody, M. Belmahi, H. N. Migeon et J. Bougdira Synthesis of carbon nitride thin films by N2/CH4 microwave plasma assisted by chemical vapor deposition: characterisation of discharge and the obtained films Plasma Processes and Polymers, 4:210-214 Annee 2007 Equipe: Département CP2S : EFCM
	D. Pilloud, J.F. Pierson, P. Steyer, A. Mege, B. Stauder et P. Jacquot Use of silane for the deposition of hard and oxidation resistant Ti-Si-N coatings by a hybrid cathodic arc and chemical vapour process Materials Letters, 61:2506-2508 Annee 2007 Equipe: Département CP2S : EFCM

Pour l'année / Total:

19 / 105

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