Publications: Articles
Article
| Titre: | a-SiCxNy thin films deposited by a microwave plasma assisted CVD process using a CH4/N2/Ar/HMDSN mixture: methane rate effect |
|---|---|
| Auteurs: | Bulou, S., Le Brizoual, L., Miska, P., De Poucques, L, Hugon, R. and Belmahi, M. |
| Journal: | IOP Conference Series: Materials Science and Engineering |
| Annee: | 2010 |
| Volume: | 12 |
| Pages: | 012002 |
| Equipe: | Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS |