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Publications: Articles

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Wegrowe, J.-E., Drouhin, H.-J. and Lacour, D.
Physical Review B - Condensed Matter and Materials Physics, 89(9)

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Jana, A., Briquet, L., WIRTZ, T., Philipp, P. and Henrion, G.
Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms, 326:341-344

Resume: The deposition of multiple carbon atoms on a crystalline silicon (Si) surface is modelled at 5 eV energy by using molecular dynamics simulations combined with a third generation force field that includes bond breaking and formation. Force field parameters are taken from a previous work. These simulations allow for atomic scale insights into the deposition mechanisms and an easier comparison with experimental observations. The results, including distributions of implantation depth, carbon concentrations, sticking coefficients, radial distribution function, and angular distributions are compared for different incidence angles. Due to the deposition of carbon atoms inside the silicon structure, silicon carbide starts to form. The crystalline structure has been investigated for different conditions to get a better understanding of the damaging and growth mechanisms. It is found that a lot of deformation is accumulated in the area of deposition near to the surface but underneath the surface the silicon has still a more crystalline structure. The variation of the silicon (carbide) structu re slightly depends on the angle of incidence. For the conditions used for these simulations, the sticking probability is always high and varies between 95% and 100%, which can be attributed to the high affinity of carbon for silicon.

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Wang, Y., Ghanbaja, J., SOLDERA, F., Boulet, P., Horwat, D., MUECKLICH, F. and Pierson, J. F.
ISSN: 1359-6454

Equipe: Centre de Compétences : X-Gamma rayons X et spectroscopie

Turgut, C., WIRTZ, T., Belmahi, M. and Philipp, P.
Surface and Interface Analysis, 46:357-359

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

DIEHL, R. D., Li, H. I., Su, S. Y., Mayer, A., Stanisha, N. A., Ledieu, J., Lovelock, K. R. J., Jones, Robert G., Deyko, A., Wearing, L. H., McGrath, R., Chaudhuri, A. and Woodruff, D. P.
ISSN: 0031-9007

Equipe: Département CP2S : Métallurgie et Surfaces

Fournee, Vincent, Gaudry, Emilie, Ledieu, Julian, de Weerd, Marie-Cecile, Wu, Dongmei and Lograsso, Thomas
ACS NANO, 8(4):3646-3653
ISSN: 1936-0851

Equipe: Département CP2S : Métallurgie et Surfaces

Shin, Heekeun, Schwarze, A., DIEHL, R. D., PUSSI, K., Colombier, A., Gaudry, E., Ledieu, J., McGuirk, G. M., Loli, L. N. Serkovic, Fournee, V., Wang, L. L., Schull, G. and Berndt, R.
ISSN: 1098-0121

Equipe: Département CP2S : Métallurgie et Surfaces

Bénéteau, Adeline, Aeby-Gautier, Elisabeth, Geandier, Guillaume, Weisbecker, Patrick, Redjaimia, Abdelkrim and Appolaire, Benoit
Acta Materialia, 81:30--40
ISSN: 1359-6454

Equipe: Département SI2M : Microstructures et Contraintes

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