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Dehmas, Moukrane, Salib, Matthieu, Geandier, Guillaume, Gautier, Elisabeth, Karnatak, Nikhil and Martin, Olivier
Matériaux et techniques, 100:103-105

Equipe: Département SI2M : Microstructures et Contraintes

Geandier, G., Aeby-Gautier, E., Settefrati, A., Dehmas, M. and Appolaire, B.
Comptes Rendus Physique, 13(3):257-267
ISSN: 1631-0705

Resume: High energy X-ray diffraction is a powerful tool, able to follow phase transformations during complex thermal or thermo-mechanical treatments. High energy allows one to study volumic specimens of a few mm(3) and get successive data within a few seconds or less. The technique is described with different experimental setups (heating devices, detectors for diverse acquisition times) allowing diverse ranges for heating and cooling rates. Three examples are considered to illustrate the results obtained by using high energy X-ray diffraction. The first one corresponds to a simple diffusive phase transformation during an isothermal thermal path for the alpha-beta transformation in a titanium alloy, highlighting the diffusive character considering the cell parameter evolutions of the parent phase. The second one illustrates the precipitation sequences observed during ageing of a beta-metastable phase in a titanium alloy that was not obtained by TEM. The last example illustrates the phase evolutions during ageing of a martensitic steel showing the complexity of cell parameters evolution and some evolutions of the stress state. (C) 2011 Academie des sciences. Published by Elsevier Masson SAS. All rights reserved.

Equipe: Département SI2M : Microstructures et Contraintes

Borgese, L., Gelfi, M., Bontempi, E., Goudeau, P., Geandier, G., Thiaudière, D. and Depero, L. E.
Surface and Coatings Technology, 206(8-9):2459-2463
ISSN: 0257-8972

Resume: Atomic Layer Deposition (ALD) allows the deposition of thin films onto flat as well as complex geometry surfaces with excellent conformality. Thicknesses of few atomic layers can be achieved. Moreover, low-temperature deposition is possible and this enables the change of surface properties of many kinds of materials. Good adhesion characteristics and also good mechanical performance of ALD deposited thin films make the technique extremely interesting for several applications, as for example micro-electronics. TiO2 is a well studied semiconductor material because of its multifunctional properties that open a wide range of applications for example in photocatalysis, optics and solar cells. ALD is extremely completive to other technique, to deposit titania thin films, employed even to improve the biocompatibility of many kind of materials. TiO2 thin films are deposited with ALD technique at low temperature (90 degrees C) onto Kapton substrate and then crystallized ex-situ after annealing at 300 degrees C. X-ray diffraction (XRD) techniques are very suitable for the analysis of structure and microstructure of films and surface layers. In this work, XRD in combination with in situ tensile testing has been applied for the first time to measure elastic properties (elastic modulus and Poisson ratio) of TiO2 anatase thin films obtained by ALD. For the experimental conditions, the tensile stage was installed in a Synchrotron laboratory of Soleil. The information extracted from diffraction patterns is presented. (C) 2011 Elsevier B.V. All rights reserved.

Equipe: Département SI2M : Microstructures et Contraintes

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