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References

Articles:

Rougemaille, N., Montaigne, F., Canals, B., Duluard, A., Lacour, D., Hehn, M., Belkhou, R., Fruchart, O., El Moussaoui, S., Bendounan, A. and MacCherozzi, F.
Physical Review Letters, 106(5)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Rougemaille, N., Montaigne, F., Canals, B., Duluard, A., Lacour, D., Hehn, M., Belkhou, R., Fruchart, O., El Moussaoui, S., Bendounan, A. and MacCherozzi, F.
Physical Review Letters, 106(5)
2011

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

BERTHOD, P., HESTIN, O. and SOUAILLAT, E.
Materials Science: An Indian Journal, 7(1)
2011

Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux

Shiroka, T., Lamura, G., renzi, R. De, Belli, M., Emery, N., Rida, H., Cahen, S., Mareche, J. F., Lagrange, P. and Herold, C.
New J. Phys., 13:013038
2011

Equipe: Département CP2S : Matériaux Carbonés

Aubert, T., Elmazria, O., Assouar, B., Bouvot, L., Hehn, M., Weber, S., Oudich, M. and Genève, D.
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, 58(3):603-610
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Aubert, T., Elmazria, O., Assouar, B., Bouvot, L., Hehn, M., Weber, S., Oudich, M. and Genève, D.
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, 58(3):603-610
2011

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

Bieber, T., de Poucques, L., Vasseur, J. L., Hugon, R., Belmahi, M. and Bougdira, J.
Surface & Coatings Technology, 205:S384-S387
2011

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Belmonte, T., Gries, T., Cardoso, R.P., Arnoult, G., Kosior, F. and Henrion, G.
Plasma Sources Science and Technology, 20:024004
2011

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Belmonte, T., Gries, T., Cardoso, R. P., Arnoult, G., Kosior, F. and Henrion, G.
PLASMA SOURCES SCIENCE & TECHNOLOGY, 20(2)
2011
ISSN: 0963-0252

Resume: This paper describes several specific aspects of atmospheric plasma deposition carried out with a microwave resonant cavity. Deposition over a wide substrate is first studied. We show that high deposition rates (several hundreds of mu m h(-1)) are due to localization of fluxes on the substrate by convection when slightly turbulent flows are used. Next, we describe possible routes to localize deposition over a nanometre-sized area. Scaling down atmospheric plasma deposition is possible and two strategies to reach nanometre scales are described. Finally, we study self-organization of SiO(2) nanodots deposited by chemical vapour deposition at atmospheric pressure enhanced by an Ar-O(2) micro-afterglow operating at high temperature (>1200 K). When the film being deposited is thin enough (similar to 500 nm) nanodots are obtained and they can be assembled into threads to create patterned surfaces. When the coating becomes thicker (similar to 1 mu m), and for relatively high content in HMDSO, SiO(2) walls forming hexagonal cells are obtained.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Horwat, D., Zakharov, D.I., Endrino, J.L., SOLDERA, F., Anders, A., Migot, S., Karoum, R., VERNOUX, P. and Pierson, J.F.
Surface and Coatings Technology, 205:S171-S177
2011

Equipe: Département CP2S : Elaboration et Fonctionnalité de Couches Minces

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