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Articles:

Reckers, N., Cucchiara, J., Posth, O., Hassel, C., Römer, F.M., Narkowicz, R., Gallardo, R.A., Landeros, P., Zähres, H., Mangin, S., Katine, J.A., Fullerton, E.E., Dumpich, G., Meckenstock, R., Lindner, J. and Farle, M.
Physical Review B - Condensed Matter and Materials Physics, 83(18)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Tournier-Colletta, C., Kierren, B., Fagot-Revurat, Y., Chatelain, C. and Malterre, D.
PHYSICAL REVIEW B, 84(16)
2011
ISSN: 1098-0121

Equipe: Département P2M : Surfaces et Spectroscopies

CANDOLFI, C., LENOIR, B., DAUSCHER, A., KOZA, M. M., BOISSIEU, M. DE, STERNIK, M. and PARLINSKI, K.
Physical Review B: Condensed Matter, 84:224306
2011

Equipe: Département CP2S : Matériaux à propriétés thermoélectriques

Chaput, L., Tournier-Colletta, C., Cardenas, L., Tejeda, A., Kierren, B., Malterre, D., Fagot-Revurat, Y., Le Fèvre, P., Bertran, F., Taleb-Ibrahimi, A., Trabada, D. G., Ortega, J. and Flores, F.
PHYSICAL REVIEW LETTERS, 107(18)
2011
ISSN: 0031-9007

Equipe: Département P2M : Surfaces et Spectroscopies

KIRYUKHANTSEV_KORNEEV, PH. V., Pierson, J.F., BAUER, J.PH., Levashov, E.A. and SHTANSKY, D. V.
Glass Physics and Chemistry, 37:411â??417
2011

Equipe: Département CP2S : Elaboration et Fonctionnalité de Couches Minces

Cardoso, R. P., Belmonte, T., Kosior, F., Henrion, G. and Tixhon, E.
Thin Solid Films, 519(13):4177-4185
2011

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Cardoso, R. P., Belmonte, T., Kosior, F., Henrion, G. and Tixhon, E.
THIN SOLID FILMS, 519(13):4177-4185
2011
ISSN: 0040-6090

Mots clefs: Plasma-enhanced chemical vapor deposition; Hexamethyldisiloxane; Microwave assisted chemical vapor deposition; Resonant cavity; Afterglow; Post discharge

Resume: The post-discharge of a microwave resonant cavity working at atmospheric pressure is used to enhance deposition of SiOx thin films from HMDSO by chemical vapor deposition. Maximum static deposition rates are close to 150 mu m h(-1) for low power consumption per unit of coated width (similar to 100 W/cm). Dynamic deposition rates are close to 3.5 nm ms(-1). The distribution of the coating thickness is heterogeneous over an area of 150 x 90 mm(2). The influence of the main parameters of the process is systematically studied to show how the key reactions, i.e. gas phase synthesis of powders and surface deposition, are correlated. (C) 2011 Elsevier B.V. All rights reserved.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Sharypov, V.I., Grishechko, L. I., Tarasova, L. S., Baryshnikov, S. V., Celzard, A. and Kuznetsov, B. N.
Journal of the Siberian Federal University. Chemistry, 4:221-232
2011

Equipe: Département CP2S : Matériaux Carbonés

Rahim, A. A., Kassim, M. J., ROCCA, E. and STEINMETZ, J.
Corrosion Engineering Science and Technology, 46(4):425-431.
2011

Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux

Bernardelli, E. A., Souza, T., Mafra, M., Maliska, A. M., Belmonte, T. and Klein, A. N.
Materials Research-Ibero-American Journal of Materials, 14(4):519-523
2011

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

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