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References

Articles:

Nabais, C., Schneider, R., Bellouard, C., Lambert, J., Willmann, P. and Billaud, D.
Materials Chemistry and Physics, 117(1):268-275
2009

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Nabais, C, Schneider, R, Bellouard, C, Lambert, J, Willmann, P and Billaud, D
Materials chemistry and physics, 117(1):268-275
2009

Equipe: Département CP2S : Matériaux Carbonés

Cardoso, R. P., Belmonte, T., Noel, C., Kosior, F. and Henrion, G.
Journal of Applied Physics, 105(9):093306 (8pp)
2009

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Cardoso, R. P., Belmonte, T., Noel, C., Kosior, F. and Henrion, G.
JOURNAL OF APPLIED PHYSICS, 105(9)
2009
ISSN: 0021-8979

Resume: Filamentation in an argon plasma is studied using a microwave cavity at atmospheric pressure. We show that the size and gas temperature of the filaments increase with the power absorbed by the plasma. The appearance of an additional filament occurs at specific values of the absorbed power. Each new filament appears with a smaller diameter than that of its parent filament but the sum of the diameters of all filaments evolves linearly with the absorbed power. A secondary filament emerges from a set of microfilaments created by a perturbation of the electric field (a slight increase in the incident power above a threshold value). This perturbation occurs over a larger radius than that of the parent filament. By resorting to modeling, we found that the filamentation process involves either a decrease in the effective frequency for momentum-transfer collisions, i.e., a lower electron temperature, or an increase in the electron density. We could show that a small change in the relative positions occupied by two filaments in the microwave cavity requires a strong variation in the electron temperature. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3125525]

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Noel, C., Duday, D., Verdier, S., Choquet, P., Belmonte, T. and Migeon, H. N.
Plasma Processes and Polymers, 6:S187-S192
2009

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Moreira, F., Sarry, F., Nicolas-Debarnot, D., Elmazria, O. and Poncin-Epaillard, F.
EPJ Applied Physics, 47(1)
2009

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

Grün, M., Miska, P., Neu, E., Steinmetz, D., Montaigne, F., Rinnert, H., Becher, C. and Vergnat, M.
Physica E: Low-Dimensional Systems and Nanostructures, 41(6):998-1001
2009

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Grün, M., Miska, P., Neu, E., Steinmetz, D., Montaigne, F., Rinnert, H., Becher, C. and Vergnat, M.
Physica E: Low-Dimensional Systems and Nanostructures, 41(6):998-1001
2009

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

Negulescu, B., Lacour, D., Montaigne, F., Gerken, A., Paul, J., Spetter, V., Marien, J., Duret, C. and Hehn, M.
Applied Physics Letters, 95(11)
2009

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Negulescu, B., Lacour, D., Montaigne, F., Gerken, A., Paul, J., Spetter, V., Marien, J., Duret, C. and Hehn, M.
Applied Physics Letters, 95(11)
2009

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

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