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Publications déposées dans HAL depuis 2013

Autres publications

Articles scientifiques

Congrès - Conférences

Publications: Articles

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Toutes :: 2003, ... , 2007, 2008, 2009, ... , 2015

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Tous :: R. Boulesteix, ... , Ricard, Richoux, Rida, ... , Römer

References

Articles:
•	SHARMA, H. R., Fournee, V., Shimoda, M., Ross, A. R., Lograsso, T. A., Gille, P. and Tsai, A. P. Growth of Bi thin films on quasicrystal surfaces PHYSICAL REVIEW B, 78(15) 2008 ISSN: 1098-0121 DOI: 10.1103/PhysRevB.78.155416 Equipe: Département CP2S : Métallurgie et Surfaces
•	RAPIN, C., PODOR, R., GASSERT, J. and VILASI, M. Impedance spectroscopy applied to metal corrosion study. Materials Science Forum, 595-598:1119-1126 2008 Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux
•	Diliberto, S., Richoux, V., Stein, N. and Boulanger, C. Influence of pulsed electrodeposition on stoichiometry and thermoelectric properties of bismuth telluride films Physica Status Solidi a-Applications and Materials Science, 205(10):2340-2344 2008 Equipe: Département CP2S : Chimie et électrochimie des matériaux
•	RAPIN, C., PODOR, R., VILASI, M., BERTHOD, P. and STEINMETZ, P. La recherche verrière en France : Le Laboratoire de Chimie du Solide Minéral. Verre, 4(1):8-10 2008 Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux
•	Morniroli, J. P., Houdellier, F., Roucau, C., Puiggali, J., Gesti, S. and Redjaïmia, A. LACDIF, a New Electron Diffraction Technique Obtained with the LACBED Configuration and a Cs Corrector. Comparaison with Electron Precession. Ultramicroscopy, 108 (2)(2):100-115 2008 ISSN: 0304-3991 DOI: 10.1016/j.ultramic.2007.03.006 Resume: By combining the large-angle convergent-beam electron diffraction (LACBED) configuration together with a microscope equipped with a C., corrector it is possible to obtain good quality spot patterns in image mode and not in diffraction mode as it is usually the case. These patterns have two main advantages with respect to the conventional selected-area electron diffraction (SAED) or microdiffraction patterns. They display a much larger number of reflections and the diffracted intensity is the integrated intensity. These patterns have strong similarities with the electron precession patterns and they can be used for various applications like the identification of the possible space groups of a crystal from observations of the Lane zones or the ab-initio structure identifications. Since this is a defocused method, another important application concerns the analysis of electron beam-sensitive materials. Successful applications to polymers are given in the present paper to prove the validity of this method with regards to these materials. (c) 2007 Elsevier B.V. All rights reserved. Equipe: Département SI2M : Microstructures et Contraintes
•	Tondi, G, Pizzi, A, Pasch, H, Celzard, A and Rode, K MALDI-ToF investigation of furanic polymer foams before and after carbonization: Aromatic rearrangement and surviving furanic structures European polymer journal, 44:2938-2943 2008 Equipe: Département CP2S : Matériaux Carbonés
•	Le Brizoual, L., Krüger, J.K., Elmazria, O., Vincent, B., Bouvot, L., Kolle, M., Rouxel, D. and Alnot, P. Mapping of microwave-induced phonons by ?-Brillouin spectroscopy: Hypersons in ZnO on silicon Journal of Physics D: Applied Physics, 41(10) 2008 http://www.scopus.com/inw...20521902531ff59d360e40d2b Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies
•	BERTHOD, P., LEMOINE, P. and RAVAU, J. Microstructures at high temperature of Fe-30wt.%Cr-xC Alloys with x varying from 0% to 2wt.% International Journal of Materials Research, 99(9):964-972 2008 Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux
•	ROYER, L., MATHIEU, S., LIEBAUT, C. and STEINMETZ, P. Oxidation and Nitridation of pure chromium at elevated temperature in synthetic air - Effect of silicon addition Materials Science Forum, :1047-1055 2008 Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux
•	Marcos, G., Rhallabi, A. and Ranson, P. Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition Applied Surface Science, 254(11):3576-3584 2008 Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

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