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Publications: Articles

Toutes :: 2002, ... , 2013, 2014, 2015, 2016
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Tous :: S. Aida, ... , Shen, Shepperd, Shi, ... , Szymczak 
References par page: Mots clefs Voir les resumes


Liu, H., Bedau, D., Sun, J.Z., Mangin, S., Fullerton, E.E., Katine, J.A. and Kent, A.D.
Journal of Magnetism and Magnetic Materials, 358-359:233-258

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Szymczak, Jonathan, Legeai, Sophie, Michel, Stéphanie, Diliberto, Sébastien, Stein, Nicolas and Boulanger, Clotilde
Electrochimica Acta, 137(0):586-594

Mots clefs: Bismuth telluride Ionic liquid Electrodeposition Thermoelectricity

Resume: Abstract In this paper, we report the electrodeposition of stoichiometric Bi2Te3 compound using an ionic liquid binary mixture: 1-ethyl-1-octyl-piperidinium bis(trifluoromethylsulfonyl)imide: 1-ethyl-1-octyl-piperidinium bromide (EOPipTFSI:EOPipBr 95:5 (mol%)). The use of this mixture allows to reach a higher solubility of Bi(III) and Te(IV) precursors compared to pure EOPipTFSI ionic liquid in which Te(IV) salts are not soluble. Moreover, this electrolyte presents an extended cathodic stability, allowing the study of electrochemical processes that occur at high cathodic potential values. A detailed voltammetric study of electrochemical systems was performed for electrolytes containing different [Bi(III)]/[Te(IV)] ratio, allowing the attribution of cathodic signals to electrochemical processes. Experimental conditions leading to the deposition of stoichiometric Bi2Te3 were then determined by varying deposition potential and electrolyte composition, using potentiostatic experiments followed by XRD and SEM-EDX analysis. By varying the concentration of precursors in the electrolyte, mirror-like coatings, adherent and homogeneous, were obtained. Electroplated Bi2Te3 presents n-type conductivity with a Seebeck coefficient equal to ?70 ?V K?1 and an electrical resistivity of 133 ?? m.

Equipe: Département CP2S : Chimie et électrochimie des matériaux

Vasseur, G., Fagot-Revurat, Y., Kierren, B., Sicot, M. and Malterre, D.
ISSN: 1098-0121

Equipe: Département P2M : Surfaces et Spectroscopies

Mangin, S., Gottwald, M., Lambert, C.-H., Steil, D., Uhlír, V., Pang, L., Hehn, M., Alebrand, S., Cinchetti, M., Malinowski, G., Fainman, Y., Aeschlimann, M. and Fullerton, E.E.
Nature Materials, 13(3):286-292

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Baringhaus, Jens, Ruan, Ming, Edler, Frederik, Tejeda, Antonio, Sicot, Muriel, Taleb-Ibrahimi, Amina, Li, An-Ping, Jiang, Zhigang, Conrad, Edward H., Berger, Claire, Tegenkamp, Christoph and de Heer, Walt A.
NATURE, 506(7488):349-354
ISSN: 0028-0836

Equipe: Département P2M : Surfaces et Spectroscopies

Barwe, B., Stein, A., E. Cibulka, O., Ghanbaja, J., Belmonte, T. and Benedikt, J.
Plasma Processes and Polymers, in press

Resume: Silicon nanostructures are synthesized with a DC atmospheric pressure microplasma jet using an Ar/SiH4/H2 gas mixture. The plasma is characterized by OES and imaged using an EMCCD camera. The effect of hydrogen admixture to the formed structures is studied by transmission electron microscopy. Under specific conditions, crystalline silicon nanoparticles grow in an amorphous matrix investigated by electron energy loss spectroscopy. As-grown silicon nanoparticles are collected in ethanol for dynamic light scattering and photoluminescence measurements. The size distribution peaks at 4â??nm. The silicon nanocrystals exhibit roomtemperature photoluminescence that peaks at ~415 and ~465 nm

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Saa, D. Kuete, Cardoso, R. P., Kosior, F., Al Taweel, A., Gries, T., Laminsi, S. and Belmonte, T.
SURFACE & COATINGS TECHNOLOGY, 255:3-7 Belmonte, T (Reprint Author), Univ Lorraine, Inst Jean Lamour, UMR CNRS 7198, F-54042 Nancy, France. Saa, D. Kuete; Kosior, F.; Al Taweel, A.; Gries, T.; Belmonte, T., Univ Lorraine, Inst Jean Lamour, UMR CNRS 7198, F-54042 Nancy, France. Saa, D. Kuete; Laminsi, S., Univ Yaounde I, Lab Chim Minerale, Yaounde 812, Cameroon. Cardoso, R. P., Univ Fed Parana, BR-81531990 Curitiba, Parana, Brazil. Gries, T.; Belmonte, T., CNRS, Inst Jean Lamour, UMR CNRS 7198, F-54042 Nancy, France.
ISSN: 0257-8972

Mots clefs: RuO2; Nanostructuration; Localized growth; Micro-plasma; Afterglow

Resume: Various ruthenium dioxide nanostructures were grown locally by the oxidation of ruthenium samples with an Ar-O-2 microwave micro-afterglow operated at atmospheric pressure. A special attention was paid to the distribution of the surface temperature of the sample which evolves between 530 K and 820 K. Whatever the treatment time, the temperature and the gas composition set within the studied ranges, a general nanostructure, made of lamellae separated by 20-50 nm, is found. When the temperature rises, localized nano-sea urchins, nanotubes with square sections, nano-needles, and more complex structures are found spread over the surface. Treated surfaces were characterized by different surface diagnostics (SEM, XRD, SIMS, etc.) Finally, a growth mechanism is proposed emphasizing the role of emerging defects and stress on the appearance of localized nanostructures. (C) 2013 Elsevier B.V. All rights reserved.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Esin, V.A., Denand, B., Le Bihan, Q., Dehmas, M., Teixeira, J., Geandier, G., Denis, S., Sourmail, T. and Aeby-Gautier, E.
Acta Materialia, 80:118--131
ISSN: 1359-6454

Equipe: Département SI2M : Microstructures et Contraintes

Schoenleber, J., Stein, N. and Boulanger, C.
Journal of Electroanalytical Chemistry, 724(0):111-117

Mots clefs: Coefficient Diffusion Electrodeposition Films Sand Thermoelectric

Equipe: Département CP2S : Chimie et électrochimie des matériaux

Chambrier, M-H, Le Bail, A., Giovanelli, F., Redjaïmia, A, Florian, P., Massiot, D., Suard, E. and Goutenoire, F.
Inorganic Chemistry, 53 (1):147-159

Equipe: Département SI2M : Microstructures et Contraintes

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