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References

Articles:

Cardoso, R. P., Belmonte, T., Kosior, F., Henrion, G. and Tixhon, E.
THIN SOLID FILMS, 519(13):4177-4185
2011
ISSN: 0040-6090

Mots clefs: Plasma-enhanced chemical vapor deposition; Hexamethyldisiloxane; Microwave assisted chemical vapor deposition; Resonant cavity; Afterglow; Post discharge

Resume: The post-discharge of a microwave resonant cavity working at atmospheric pressure is used to enhance deposition of SiOx thin films from HMDSO by chemical vapor deposition. Maximum static deposition rates are close to 150 mu m h(-1) for low power consumption per unit of coated width (similar to 100 W/cm). Dynamic deposition rates are close to 3.5 nm ms(-1). The distribution of the coating thickness is heterogeneous over an area of 150 x 90 mm(2). The influence of the main parameters of the process is systematically studied to show how the key reactions, i.e. gas phase synthesis of powders and surface deposition, are correlated. (C) 2011 Elsevier B.V. All rights reserved.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Aubert, T., Assouar, M.B., Legrani, O., Elmazria, O., Tiusan, C. and Robert, S.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 29(2)
2011

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

Sharypov, V.I., Grishechko, L. I., Tarasova, L. S., Baryshnikov, S. V., Celzard, A. and Kuznetsov, B. N.
Journal of the Siberian Federal University. Chemistry, 4:221-232
2011

Equipe: Département CP2S : Matériaux Carbonés

Gabor, M.S., Petrisor, T., Tiusan, C., Hehn, M. and Petrisor, T.
Physical Review B - Condensed Matter and Materials Physics, 84(13)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Borgese, L., Bontempi, E., Gelfi, M., Depero, L. E., Goudeau, P., Geandier, G. and Thiaudière, D.
Acta Materialia, 59(7):2891-2900
2011
ISSN: 1359-6454

Resume: Amorphous TiO2 thin films were deposited by means of atomic layer deposition on Kapton substrates and then crystallized ex situ by annealing at 300 degrees C to obtain the anatase phase. The morphology, structure and microstructure of films treated for 12, 24, 72 and 90 h were investigated. The local Ti coordination changes were studied by X-ray near-edge structure (XANES). On the basis of X-ray diffraction residual stress calculations, the elastic anisotropy of the films is experimentally determined for the first time (A*(comp) = 0.07, A*(shear) = 0.03). The film macro-strains increased with the time of treatment, while the micro-strains decreased. This effect may be correlated with the incipient anatase-to-rutile transformation as suggested by the changes observed in the XANES pattern of the film treated for 90 h. However, the contribution of the substrate cannot be excluded. (C) 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

Equipe: Département SI2M : Microstructures et Contraintes

MATHIEU, R., LIBOUREL, G., DELOULE, E., TISSANDIER, L., RAPIN, C. and PODOR, R.
Geochimica and Cosmochimica, 75:608-628
2011

Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux

Duguet, T., Unal, B., Ledieu, J., DUBOIS, J.-M., Fournee, V. and THIEL, P. A.
Phys. Rev. Lett, 106:076101
2011
ISSN: 0031-9007

Equipe: Département CP2S : Métallurgie et Surfaces

Traore, Y., Legeai, S., Diliberto, S., Arrachart, G., Pellet-Rostaing, S. and Draye, M.
Electrochimica Acta, 58:532-540
2011

Equipe: Département CP2S : Chimie et électrochimie des matériaux

Bernstein, D.P., Bräuer, B., Kukreja, R., Stöhr, J., Hauet, T., Cucchiara, J., Mangin, S., Katine, J.A., Tyliszczak, T., Chou, K.W. and Acremann, Y.
Physical Review B - Condensed Matter and Materials Physics, 83(18)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Petrisor, T., Gabor, M.S., Boulle, A., Bellouard, C., Tiusan, C., Pana, O. and Petrisor, T.
Journal of Applied Physics, 109(12)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

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