Titre: | Oxygen partial pressure and substrate bias voltage influenced structural, electrical and optical properties of rf magnetron sputtered Ag2Cu2O3 films |
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Auteurs: | Uthanna, S., REDDY, M.H.P. and Pierson, J.F. |
Journal: | International Journal of Nanoscience |
Annee: | 2011 |
Volume: | 10 |
Pages: | 653-657 |
Equipe: | Département CP2S : Elaboration et Fonctionnalité de Couches Minces |