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References

2014

Articles:

K. Tillous, E., Dulcy, J. and Belmonte, T.
Oxidation of Metals, 82:163-179
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Messaoudi, M., S. Aida, M., Attaf, N., Bezzi, T., Bougdira, J. and Medjahdi, G.
Materials Science in Semiconductor Processing, 17:38-42
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Broch, Laurent, Stein, Nicolas, Zimmer, Alexandre, Battie, Yann and Naciri, Aotmane En
Thin Solid Films, 571, Part 3(0):509-512
2014

Mots clefs: Systematic errors In-situ ellipsometry Electrodeposition Bismuth telluride

Resume: Abstract We describe a spectroscopic ellipsometer in the visible domain (400–800 nm) based on a rotating compensator technology using two detectors. The classical analyzer is replaced by a fixed Rochon birefringent beamsplitter which splits the incidence light wave into two perpendicularly polarized waves, one oriented at + 45° and the other one at ? 45° according to the plane of incidence. Both emergent optical signals are analyzed by two identical CCD detectors which are synchronized by an optical encoder fixed on the shaft of the step-by-step motor of the compensator. The final spectrum is the result of the two averaged ? and ? spectra acquired by both detectors. We show that ? and ? spectra are acquired without systematic errors on a spectral range fixed from 400 to 800 nm. The acquisition time can be adjusted down to 25 ms. The setup was validated by monitoring the first steps of bismuth telluride film electrocrystallization. The results exhibit that induced experimental growth parameters, such as film thickness and volumic fraction of deposited material can be extracted with a better trueness.

Equipe: Département CP2S : Chimie et électrochimie des matériaux

Derkaoui, N., Rond, C., Gries, T., Henrion, G. and Gicquel, A.
Journal of Physics D: Applied Physics, 47:205201
2014

Resume: The electron temperature and electron density are measured in a microwave (MW) plasma-assisted chemical vapour diamond deposition reactor for different experimental conditions by varying the substrate temperature, methane content and MW power density. Optical emission spectroscopy (OES) and MW interferometry are used to probe the discharge generated in a stainless steel resonant cavity excited at a frequency of 2.45 GHz. Changing the substrate temperature from 630 to 900 ?C does not show any significant influence on the electron temperature or on the electron density. Increasing the methane content from 0 to 10% does not lead to any modification of the electron temperature or density. However between 10% and 20% CH, a decrease of the electron density is observed which may be attributed to soot particle formation. The electron density increases in the range of (1.2-10) x 1011 cm-3 from moderate power density conditions (50 hPa/1000 W) to high power density conditions (250 hPa/3500 W). OES measurements show that the electron temperature exhibits a flat axial profile in the plasma bulk and ranges from 14 000K at (25 hPa/600 W) to 10 500K at (400 hPa/3000 W).

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

El Kaouini, Morad, Chatei, Hassan and Bougdira, Jamal
Physica Scripta, 2014(T161):014052
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Liu, H., Bedau, D., Sun, J.Z., Mangin, S., Fullerton, E.E., Katine, J.A. and Kent, A.D.
Journal of Magnetism and Magnetic Materials, 358-359:233-258
2014

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Escande, Vincent, Garoux, Laetitia, Grison, Claire, Thillier, Yann, Debart, Francoise, Vasseur, Jean-Jacques, Boulanger, Clothilde and Grison, Claude
Applied Catalysis., B, 146:279-288
2014

Resume: Metallophyte plants derived from phytoextn. are used as starting materials to prep. novel polymetallic catalysts. Polymetallic catalyst activity is used in many Lewis acid catalyzed reactions according to the polymetallic catalyst prepn. The synergetic catalysis of these systems leads to efficient syntheses of complex biomols. such as dihydropyrimidinone, 5'-capped DNA and RNA, and glycosyl aminoacid. These new polymetallic catalysts also bring new possibilities in Green Catalysis, that we named "Ecol. Catalysis". [on SciFinder(R)]

Equipe: Département CP2S : Chimie et électrochimie des matériaux

Margueron, S., Ropers, S., Genty, F., Bartasyte, A. and Belmonte, T.
Materials Chemistry and Physics, 147:623-628
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Szymczak, Jonathan, Legeai, Sophie, Michel, Stéphanie, Diliberto, Sébastien, Stein, Nicolas and Boulanger, Clotilde
Electrochimica Acta, 137(0):586-594
2014

Mots clefs: Bismuth telluride Ionic liquid Electrodeposition Thermoelectricity

Resume: Abstract In this paper, we report the electrodeposition of stoichiometric Bi2Te3 compound using an ionic liquid binary mixture: 1-ethyl-1-octyl-piperidinium bis(trifluoromethylsulfonyl)imide: 1-ethyl-1-octyl-piperidinium bromide (EOPipTFSI:EOPipBr 95:5 (mol%)). The use of this mixture allows to reach a higher solubility of Bi(III) and Te(IV) precursors compared to pure EOPipTFSI ionic liquid in which Te(IV) salts are not soluble. Moreover, this electrolyte presents an extended cathodic stability, allowing the study of electrochemical processes that occur at high cathodic potential values. A detailed voltammetric study of electrochemical systems was performed for electrolytes containing different [Bi(III)]/[Te(IV)] ratio, allowing the attribution of cathodic signals to electrochemical processes. Experimental conditions leading to the deposition of stoichiometric Bi2Te3 were then determined by varying deposition potential and electrolyte composition, using potentiostatic experiments followed by XRD and SEM-EDX analysis. By varying the concentration of precursors in the electrolyte, mirror-like coatings, adherent and homogeneous, were obtained. Electroplated Bi2Te3 presents n-type conductivity with a Seebeck coefficient equal to ?70 ?V K?1 and an electrical resistivity of 133 ?? m.

Equipe: Département CP2S : Chimie et électrochimie des matériaux

Dubois, J. -M. and Belin-Ferré, E.
ACTA PHYSICA POLONICA A, 126(2):453-457
2014
ISSN: 0587-4246

Equipe: Département CP2S : Métallurgie et Surfaces

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