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Publications: Articles

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Toutes :: 2011, 2013, 2014
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Tous :: Gries, Grysan 
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References

2014

Articles:

Audinot, J. -N., Hamdan, A., Grysan, P., Fleming, Y., Noel, C., Kosior, F., Henrion, G. and Belmonte, T.
SURFACE AND INTERFACE ANALYSIS, 46(1, SI):397-400 Audinot, JN (Reprint Author), Ctr Rech Publ Gabriel Lippmann, SAM Dept, 41 Rue Brill, L-4422 Belvaux, Luxembourg. Audinot, J. -N.; Grysan, P.; Fleming, Y., Ctr Rech Publ Gabriel Lippmann, SAM Dept, L-4422 Belvaux, Luxembourg. Hamdan, A.; Noel, C.; Kosior, F.; Henrion, G.; Belmonte, T., Univ Lorraine, Inst Jean Lamour, CNRS, UMR 7198,CS 50840, F-54011 Nancy, France.
2014
ISSN: 0142-2421

Mots clefs: imaging; combinaison; characterization; plasma; nanosims; 3D

Resume: The discharge between a platinum electrode and different metallic monolayers on a silicon substrate produced sub-micrometric structures. The scanning electron microscope images showed the formation of craters with cones, holes, corona, and other exotic structures. The atomic force microscopy images allowed evaluating the depth and height of these complex structures together with the chemical information as determined by NanoSIMS imaging. The plasma impacts locally removed the mono-layer and the bilayer down to the bare silicon substrate. In order to convert the acquired NanoSIMS images into a true three-dimensional distribution of the analyzed species, the SIMS images are overlapped with the corresponding atomic force microscopy images of the same probed area. This analysis method allows a visualization of a complex 3D structure and helps understand the formation mechanisms of the streamer impact. Copyright (c) 2014 John Wiley & Sons, Ltd.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Saa, D. Kuete, Cardoso, R. P., Kosior, F., Al Taweel, A., Gries, T., Laminsi, S. and Belmonte, T.
SURFACE & COATINGS TECHNOLOGY, 255:3-7 Belmonte, T (Reprint Author), Univ Lorraine, Inst Jean Lamour, UMR CNRS 7198, F-54042 Nancy, France. Saa, D. Kuete; Kosior, F.; Al Taweel, A.; Gries, T.; Belmonte, T., Univ Lorraine, Inst Jean Lamour, UMR CNRS 7198, F-54042 Nancy, France. Saa, D. Kuete; Laminsi, S., Univ Yaounde I, Lab Chim Minerale, Yaounde 812, Cameroon. Cardoso, R. P., Univ Fed Parana, BR-81531990 Curitiba, Parana, Brazil. Gries, T.; Belmonte, T., CNRS, Inst Jean Lamour, UMR CNRS 7198, F-54042 Nancy, France.
2014
ISSN: 0257-8972

Mots clefs: RuO2; Nanostructuration; Localized growth; Micro-plasma; Afterglow

Resume: Various ruthenium dioxide nanostructures were grown locally by the oxidation of ruthenium samples with an Ar-O-2 microwave micro-afterglow operated at atmospheric pressure. A special attention was paid to the distribution of the surface temperature of the sample which evolves between 530 K and 820 K. Whatever the treatment time, the temperature and the gas composition set within the studied ranges, a general nanostructure, made of lamellae separated by 20-50 nm, is found. When the temperature rises, localized nano-sea urchins, nanotubes with square sections, nano-needles, and more complex structures are found spread over the surface. Treated surfaces were characterized by different surface diagnostics (SEM, XRD, SIMS, etc.) Finally, a growth mechanism is proposed emphasizing the role of emerging defects and stress on the appearance of localized nanostructures. (C) 2013 Elsevier B.V. All rights reserved.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

2013

Articles:

Hamdan, A., Kosior, F., Noel, C., Henrion, G., Audinot, J-N, Gries, T. and Belmonte, T.
JOURNAL OF APPLIED PHYSICS, 113(21) Belmonte, T (Reprint Author), Univ Lorraine, CNRS, Dept CP2S, Inst Jean Lamour, Parc Saurupt,CS 50840, F-54011 Nancy, France. Hamdan, A.; Kosior, F.; Noel, C.; Henrion, G.; Gries, T.; Belmonte, T., Univ Lorraine, CNRS, Dept CP2S, Inst Jean Lamour, F-54011 Nancy, France. Audinot, J-N, Ctr Rech Publ Gabriel Lippmann, SAM Dept, L-4422 Belvaux, Luxembourg.
2013

Resume: The main processes related to discharges between pin and plate electrodes in hydrocarbon liquid (heptane) are modelled for micro-gap (from 10 to 100 mu m) conditions. When a plasma channel hits the surface, a micro-crater is created. The different phenomena controlling the geometry (shape and dimension) of a single crater are described and included in a theoretical model developed for the specific case of pure aluminium. The influence of the most important parameters affecting the geometry of the crater is discussed. Among them, one finds the pressure exerted by the plasma on the liquid metal. It is found that the distribution of the pressure applied on the liquid pool changes significantly the way the plasma shapes the pool. It is assumed that at high charges, the pressure profile is tilted from the channel axis, leading to the formation of a central protrusion. On the other hand, we demonstrate that Thomson-Marangoni forces play an important role for crater diameters smaller than 5 mu m. Then, the choice of the first derivative of the surface tension with respect to the temperature is a key factor. This effect is strongly related to the way convection displaces matter in the liquid pool. Finally, the quenching step is sufficiently fast to freeze the liquid shape as soon as the plasma vanishes. (C) 2013 AIP Publishing LLC.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

2011

Articles:

Belmonte, T., Gries, T., Cardoso, R. P., Arnoult, G., Kosior, F. and Henrion, G.
PLASMA SOURCES SCIENCE & TECHNOLOGY, 20(2)
2011
ISSN: 0963-0252

Resume: This paper describes several specific aspects of atmospheric plasma deposition carried out with a microwave resonant cavity. Deposition over a wide substrate is first studied. We show that high deposition rates (several hundreds of mu m h(-1)) are due to localization of fluxes on the substrate by convection when slightly turbulent flows are used. Next, we describe possible routes to localize deposition over a nanometre-sized area. Scaling down atmospheric plasma deposition is possible and two strategies to reach nanometre scales are described. Finally, we study self-organization of SiO(2) nanodots deposited by chemical vapour deposition at atmospheric pressure enhanced by an Ar-O(2) micro-afterglow operating at high temperature (>1200 K). When the film being deposited is thin enough (similar to 500 nm) nanodots are obtained and they can be assembled into threads to create patterned surfaces. When the coating becomes thicker (similar to 1 mu m), and for relatively high content in HMDSO, SiO(2) walls forming hexagonal cells are obtained.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

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