linkedintwitter
Annuaire  |  Flux RSS  |  Espace presse  |  Wiki IJL  |  Webmail  |  Videos  |    Photos   Articles scientifiques  Articles scientifiques 

Publications: Articles

Annees:  
Toutes :: 2007, ... , 2011, 2012, 2013, 2014
Auteurs:  
Tous :: A, B, C, D, E, F, G, H, I, J, K, L, M, N, O, P, R, S, T, U, V, W, Y, Z 
Tous :: D. Boscher, ... , Djelloul, Dong, Dos Santos, ... , D’inca 
Preferences: 
References par page: Mots clefs Voir les resumes
References

Articles:

Desecures, M., de Poucques, L., Easwarakhanthan, T. and Bougdira, J.
Applied Physics Letters, 105:181120-181124
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

K. Tillous, E., Dulcy, J. and Belmonte, T.
Oxidation of Metals, 82:163-179
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Derkaoui, N., Rond, C., Gries, T., Henrion, G. and Gicquel, A.
Journal of Physics D: Applied Physics, 47:205201
2014

Resume: The electron temperature and electron density are measured in a microwave (MW) plasma-assisted chemical vapour diamond deposition reactor for different experimental conditions by varying the substrate temperature, methane content and MW power density. Optical emission spectroscopy (OES) and MW interferometry are used to probe the discharge generated in a stainless steel resonant cavity excited at a frequency of 2.45 GHz. Changing the substrate temperature from 630 to 900 ?C does not show any significant influence on the electron temperature or on the electron density. Increasing the methane content from 0 to 10% does not lead to any modification of the electron temperature or density. However between 10% and 20% CH, a decrease of the electron density is observed which may be attributed to soot particle formation. The electron density increases in the range of (1.2-10) x 1011 cm-3 from moderate power density conditions (50 hPa/1000 W) to high power density conditions (250 hPa/3500 W). OES measurements show that the electron temperature exhibits a flat axial profile in the plasma bulk and ranges from 14 000K at (25 hPa/600 W) to 10 500K at (400 hPa/3000 W).

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Samih, Y., Marcos, G., Stein, N., Allain, N., Fleury, E., Dong, C. and Grosdidier, T.
Surface and Coatings Technology, 259:737-745
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Belmahi, M., Bulou, S., Thouvenin, A., de Poucques, L., Hugon, R., Le Brizoual, L., Miska, P., Genève, D., Vasseur, J.-L. and Bougdira, J.
Plasma Processes and Polymers, 11:551-558
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

D. Boscher, N., Olivier, S., Maurau, R., Bulou, S., Sindzingre, T., Belmonte, T. and Choquet, P.
Applied Surface Science, 311:721-728
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Glad, X., de Poucques, L., A. Jaszczak, J., Belmahi, M., Ghanbaja, J. and Bougdira, J.
Carbon, 76:330-340
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Exbrayat, L., Calvié, E., Douillard, T., Marcos, G., Savall, C., Berziou, C., Creus, J. and Steyer, P.
ECS Electrochemistry Letters, 39:D33-D35
2014

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Cette annee / Total:
8 / 66
Exporter au format:
BibTeX, XML