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Articles:

Devynck, S., Gradeck, M., Bellot, J.P., Denis, S., Vaelez, M. and Benard, T.
Key Engineering Materials, 504-506:1049-1054
2012

Equipe: Département SI2M : Microstructures et Contraintes

Brunetti, G., Settefrati, A., Hazotte, A., Denis, S., Fundenberger, J. -J., Tidu, A. and Bouzy, E.
Micron, 43(2-3):396-406
2012
ISSN: 0968-4328

Resume: In single-crystal nickel-based superalloys, the lattice mismatch associated with interface coherency between gamma matrix and gamma' precipitates has a strong influence on mechanical properties. The unconstrained lattice misfit in a single-crystal of the MC2 nickel-based superalloy is determined using convergent beam electron diffraction measurements and finite element calculations. The apparent lattice parameters of both constrained phases are obtained in thin foils, using a new multi-pattern approach, which allows for unambiguous determination of all the lattice parameters considering the real symmetry of the strained crystals. Finite element calculations are used to establish relations between the constrained and unconstrained lattice parameters, with the stress relaxation resulting from the thin foil geometry taken into account. (C) 2011 Elsevier Ltd. All rights reserved.

Equipe: Département SI2M : Microstructures et Contraintes

Borgese, L., Gelfi, M., Bontempi, E., Goudeau, P., Geandier, G., Thiaudière, D. and Depero, L. E.
Surface and Coatings Technology, 206(8-9):2459-2463
2012
ISSN: 0257-8972

Resume: Atomic Layer Deposition (ALD) allows the deposition of thin films onto flat as well as complex geometry surfaces with excellent conformality. Thicknesses of few atomic layers can be achieved. Moreover, low-temperature deposition is possible and this enables the change of surface properties of many kinds of materials. Good adhesion characteristics and also good mechanical performance of ALD deposited thin films make the technique extremely interesting for several applications, as for example micro-electronics. TiO2 is a well studied semiconductor material because of its multifunctional properties that open a wide range of applications for example in photocatalysis, optics and solar cells. ALD is extremely completive to other technique, to deposit titania thin films, employed even to improve the biocompatibility of many kind of materials. TiO2 thin films are deposited with ALD technique at low temperature (90 degrees C) onto Kapton substrate and then crystallized ex-situ after annealing at 300 degrees C. X-ray diffraction (XRD) techniques are very suitable for the analysis of structure and microstructure of films and surface layers. In this work, XRD in combination with in situ tensile testing has been applied for the first time to measure elastic properties (elastic modulus and Poisson ratio) of TiO2 anatase thin films obtained by ALD. For the experimental conditions, the tensile stage was installed in a Synchrotron laboratory of Soleil. The information extracted from diffraction patterns is presented. (C) 2011 Elsevier B.V. All rights reserved.

Equipe: Département SI2M : Microstructures et Contraintes

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