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Articles:

Belmonte, T., Gries, T., Cardoso, R. P., Arnoult, G., Kosior, F. and Henrion, G.
PLASMA SOURCES SCIENCE & TECHNOLOGY, 20(2)
2011
ISSN: 0963-0252

Resume: This paper describes several specific aspects of atmospheric plasma deposition carried out with a microwave resonant cavity. Deposition over a wide substrate is first studied. We show that high deposition rates (several hundreds of mu m h(-1)) are due to localization of fluxes on the substrate by convection when slightly turbulent flows are used. Next, we describe possible routes to localize deposition over a nanometre-sized area. Scaling down atmospheric plasma deposition is possible and two strategies to reach nanometre scales are described. Finally, we study self-organization of SiO(2) nanodots deposited by chemical vapour deposition at atmospheric pressure enhanced by an Ar-O(2) micro-afterglow operating at high temperature (>1200 K). When the film being deposited is thin enough (similar to 500 nm) nanodots are obtained and they can be assembled into threads to create patterned surfaces. When the coating becomes thicker (similar to 1 mu m), and for relatively high content in HMDSO, SiO(2) walls forming hexagonal cells are obtained.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Horwat, D., Zakharov, D.I., Endrino, J.L., SOLDERA, F., Anders, A., Migot, S., Karoum, R., VERNOUX, P. and Pierson, J.F.
Surface and Coatings Technology, 205:S171-S177
2011

Equipe: Département CP2S : Elaboration et Fonctionnalité de Couches Minces

Andryushechkin, B. V., Cherkez, V. V., Kierren, B., Fagot-Revurat, Y., Malterre, D. and Eltsov, K. N.
PHYSICAL REVIEW B, 84(20)
2011
ISSN: 1098-0121

Equipe: Département P2M : Surfaces et Spectroscopies

MESBAH, A., ARANDA, L., STEINMETZ, J., ROCCA, E. and FRANCOIS, M.
Solid state sciences, 13(7):1438-1442.
2011

Equipe: Département CP2S : Surface et Interface, réactivité chimique des matériaux

Aldeek, Fadi, Mustin, Christian, Balan, Lavinia, Medjahdi, Ghouti, Roques-Carmes, Thibault, Arnoux, Philippe and Schneider, Raphael
EUROPEAN JOURNAL OF INORGANIC CHEMISTRY, :794-801
2011
ISSN: 1434-1948

Equipe: Centre de Compétences : X-Gamma rayons X et spectroscopie

PORTEHAULT, D., MANEERATANAN, V., CANDOLFI, C., OESCHLER, N., VEREMCHUK, I., GRIN, YU., SANCHEZ, C. and ANTONIETTI, M.
ACS Nano, 5:9052
2011

Equipe: Département CP2S : Matériaux à propriétés thermoélectriques

Celzard, A., Fierro, V., Amaral-Labat, G., Pizzi, A. and Torero, J.
Polymer degradation and stability, 96:477-482
2011

Equipe: Département CP2S : Matériaux Carbonés

Aubert, T., Assouar, M.B., Legrani, O., Elmazria, O., Tiusan, C. and Robert, S.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 29(2)
2011

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

Addou, R., SHUKLA, A. K., ALARCON-VILLESECA, S., Gaudry, E., Deniozou, Th., Heggen, M., Feuerbacher, M., Widmer, R., Groening, O., Fournee, V., Dubois, J. M. and Ledieu, J.
New journal of physics, 13:103011
2011
ISSN: 1367-2630

Equipe: Département CP2S : Métallurgie et Surfaces

CANDOLFI, C., AYDEMIR, U., ORMECI, A., BAITINGER, M., OESCHLER, N., GRIN, YU. and STEGLICH, F.
Physical Review B: Condensed Matter, 83:205102
2011

Equipe: Département CP2S : Matériaux à propriétés thermoélectriques

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