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Publications: Articles

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References

Articles:

Cucchiara, J., Fullerton, E.E., Kent, A.D., Sun, J.Z., Henry, Y. and Mangin, S.
Physical Review B - Condensed Matter and Materials Physics, 84(10)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

HODROJ, A. and Pierson, J.F.
Applied Surface Science, 257:8525-8528
2011

Equipe: Département CP2S : Elaboration et Fonctionnalité de Couches Minces

Reckers, N., Cucchiara, J., Posth, O., Hassel, C., Römer, F.M., Narkowicz, R., Gallardo, R.A., Landeros, P., Zähres, H., Mangin, S., Katine, J.A., Fullerton, E.E., Dumpich, G., Meckenstock, R., Lindner, J. and Farle, M.
Physical Review B - Condensed Matter and Materials Physics, 83(18)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Da Silva, M., Dumesnil, K., Dufour, C., Hehn, M., Pierre, D., Lacour, D., Montaigne, F., Lengaigne, G. and Robert, S.
Applied Physics Letters, 98(23)
2011

Equipe: Département P2M : Nanomagnétisme et Electronique de Spin

Da Silva, M., Dumesnil, K., Dufour, C., Hehn, M., Pierre, D., Lacour, D., Montaigne, F., Lengaigne, G. and Robert, S.
Applied Physics Letters, 98(23)
2011

Equipe: Centre de Compétences : MiNaLor micro et nanotechnologies

Da Silva, M., Dumesnil, K., Dufour, C., Hehn, M., Pierre, D., Lacour, D., Montaigne, F., Lengaigne, G. and Robert, S.
APPLIED PHYSICS LETTERS, 98
2011
ISSN: 0003-6951

Equipe: Centre de Compétences : X-Gamma rayons X et spectroscopie

HARI PRASAD REDDY, M., Pierson, J.F. and Uthanna, S.
Crystal Research and Technology, 46:1329-1336
2011

Equipe: Département CP2S : Elaboration et Fonctionnalité de Couches Minces

Cardoso, R. P., Belmonte, T., Kosior, F., Henrion, G. and Tixhon, E.
Thin Solid Films, 519(13):4177-4185
2011

Equipe: Département CP2S : Expériences et Simulations des Plasmas Réactifs - Interaction plasma-surface et Traitement des Surfaces ESPRITS

Cardoso, R. P., Belmonte, T., Kosior, F., Henrion, G. and Tixhon, E.
THIN SOLID FILMS, 519(13):4177-4185
2011
ISSN: 0040-6090

Mots clefs: Plasma-enhanced chemical vapor deposition; Hexamethyldisiloxane; Microwave assisted chemical vapor deposition; Resonant cavity; Afterglow; Post discharge

Resume: The post-discharge of a microwave resonant cavity working at atmospheric pressure is used to enhance deposition of SiOx thin films from HMDSO by chemical vapor deposition. Maximum static deposition rates are close to 150 mu m h(-1) for low power consumption per unit of coated width (similar to 100 W/cm). Dynamic deposition rates are close to 3.5 nm ms(-1). The distribution of the coating thickness is heterogeneous over an area of 150 x 90 mm(2). The influence of the main parameters of the process is systematically studied to show how the key reactions, i.e. gas phase synthesis of powders and surface deposition, are correlated. (C) 2011 Elsevier B.V. All rights reserved.

Equipe: Centre de Compétences : ERMIONE informatique et calcul

Jullien, M., Endrino, J.L., MANZEH, F., ESCOBAR GALINDO, R., BAUER, J-PH., Pierson, J.F. and Horwat, D.
Solar Energy Materials and Solar Cells, 95:2341-2346
2011

Equipe: Département CP2S : Elaboration et Fonctionnalité de Couches Minces

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