This file was created by the TYPO3 extension bib --- Timezone: CET Creation date: 2021-02-27 Creation time: 21-17-44 --- Number of references 3 article ISI:000290719900005 PLASMA SOURCES SCIENCE & TECHNOLOGY 2011 20 2 This paper describes several specific aspects of atmospheric plasma deposition carried out with a microwave resonant cavity. Deposition over a wide substrate is first studied. We show that high deposition rates (several hundreds of mu m h(-1)) are due to localization of fluxes on the substrate by convection when slightly turbulent flows are used. Next, we describe possible routes to localize deposition over a nanometre-sized area. Scaling down atmospheric plasma deposition is possible and two strategies to reach nanometre scales are described. Finally, we study self-organization of SiO(2) nanodots deposited by chemical vapour deposition at atmospheric pressure enhanced by an Ar-O(2) micro-afterglow operating at high temperature (>1200 K). When the film being deposited is thin enough (similar to 500 nm) nanodots are obtained and they can be assembled into threads to create patterned surfaces. When the coating becomes thicker (similar to 1 mu m), and for relatively high content in HMDSO, SiO(2) walls forming hexagonal cells are obtained. Centre de Compétences : ERMIONE informatique et calcul IOP PUBLISHING LTD

DIRAC HOUSE, TEMPLE BACK, BRISTOL BS1 6BE, ENGLAND

Article; Proceedings Paper English 0963-0252 10.1088/0963-0252/20/2/024004 T.Belmonte T.Gries R. P.Cardoso G.Arnoult F.Kosior G.Henrion article ISI:000290187100009 THIN SOLID FILMS 2011 519 13 4177-4185 The post-discharge of a microwave resonant cavity working at atmospheric pressure is used to enhance deposition of SiOx thin films from HMDSO by chemical vapor deposition. Maximum static deposition rates are close to 150 mu m h(-1) for low power consumption per unit of coated width (similar to 100 W/cm). Dynamic deposition rates are close to 3.5 nm ms(-1). The distribution of the coating thickness is heterogeneous over an area of 150 x 90 mm(2). The influence of the main parameters of the process is systematically studied to show how the key reactions, i.e. gas phase synthesis of powders and surface deposition, are correlated. (C) 2011 Elsevier B.V. All rights reserved. Centre de Compétences : ERMIONE informatique et calcul Plasma-enhanced chemical vapor deposition; Hexamethyldisiloxane; Microwave assisted chemical vapor deposition; Resonant cavity; Afterglow; Post discharge ELSEVIER SCIENCE SA

PO BOX 564, 1001 LAUSANNE, SWITZERLAND

Article English 0040-6090 10.1016/j.tsf.2011.02.003 R. P.Cardoso T.Belmonte F.Kosior G.Henrion E.Tixhon article ISI:000289512700022 JOURNAL OF PHYSICS D-APPLIED PHYSICS 2011 44 17 The origin of organization of nanostructured silica coatings deposited on stainless steel substrates by remote microplasma at atmospheric pressure is investigated. We show by resorting to thermal camera measurements coupled with modelling that deposition, limited to a few seconds in time, occurs at low temperature (similar to below 420 K) although the gas temperature may reach 1400 K. Raman analyses of deposited films with thicknesses below 1 mu m show the presence of oxidized silicon bonded to the metallic surface. The origin of nanodots is explained as follows. Close to the microplasma nozzle, the concentration of oxidizing species and/or the temperature being high enough, a silica thin film is obtained, leading to ceramic-metallic oxide interface that leads to a Volmer-Weber growth mode and to the synthesis of 3D structures over long treatment times. Far from the nozzle, the reactivity decreasing, thin films get a plasma-polymer like behaviour which leads to a Franck-Van der Merwe growth mode and films with a higher density. Other nanostructures, made of hexagonal cells, are observed but remain unexplained. Centre de Compétences : ERMIONE informatique et calcul IOP PUBLISHING LTD

TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND

Article English 10.1088/0022-3727/44/17/174022 G.Arnoult T.Belmonte F.Kosior M.Dossot G.Henrion