Thin film elaboration using a large sputtering machine (A4 scale)
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Your needs
- Innovate and develop new thin films (oxide or metallic)
- Coating elaborated by magnetron sputtering homogeneous in composition and thickness over a large area
- Ready for all type of flat substrate
Our solutions
- Magnetron sputtering machine capable of accommodating A4 format planar substrates.
- 2 large flat magnetrons (40*6cm)
- Deposition can be done in metallic and reactive mode (nitrogen and/or oxygen)
- Switching room allowing rapid substrate rotation
- Provide our skills and characterization devices to support you in your innovation process
Keywords
- Thin films
- PVD
- Sputtering
- Characterization of thin films
- Metallic
- Reactive
- Large area
- Homogeneous
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Related skills
- Deposition under ultra high vacuum (ALD – PLD – MBE)
- Material structuration
- Growth of nanomaterials
- Chemical characterization (Spectroscopies, etc.)
- Structural characterization :
- Electron microscopy (SEM – TEM)
- X-ray diffraction
- Atomic force microscopy (AFM)
Our references
Contact
- Contact the research group:
jean-francois.pierson@univ-lorraine.fr
+33 (0) 3 72 74 25 99
fabien.capon@univ-lorraine.fr
+33 (0) 3 72 74 25 96
- Contact the technology transfer office (TTO):
ijl-tto@univ-lorraine.fr
+33 (0) 3 72 74 26 04
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