Deposits and Analysis under Ultra-high vacuum of nanoMaterials Competence Center (CC D.A.U.M.)
STM microscopy
RHEED diffraction pattern
Selective thermochromic solar layer produced by sputter deposition
Activities
The D.A.U.M. Competence Center manages the platform for Depositis and Analysis under Ultra-high vacuum of nanoMaterials.
The technical platform consists in 28 ultra-high vacuum chambers, interconnected by a 70-meter long ultra-vacuum transfer tunnel, including a 30-meter section dedicated to technology transfer. It combines multi-material growth techniques with multi-dimensional analysis techniques for thin films.
This exceptional equipment aims to develop new materials with unique properties answering to different societal challenges: energy and environment for sustainable development progress, health and information storage for a fully digital society.
Thus D.A.U.M. responds to the current problems of fundamental and applied research in the field of thin films nanomaterials.
Equipment
The 28 chambers connected to the ultra-high vacuum transfer tunnel of D.A.U.M. platform allow development and in situ analysis of innovative materials, combining the properties of elementary materials, in order to improve the performance of the final object.
The combination of different materials (metals, semiconductors, oxides, nitrides, organic materials, alloys) to manufacture new devices is made possible thanks to the availability of different thin-films elaboration techniques, interconnected under ultra-high vacuum:
Equipment for developing thin layers:
- 1 Evaporation
- 6 Sputtering
- 6 Molecular Beam Epitaxy (MBE)
- 1 Atomic Layer Deposition (ALD)
- 1 Pulsed Laser Deposition (PLD)
At each stage of their growth, these hybrid materials can be studied and characterized, while staying under ultra-high vacuum, by using different surface analysis techniques:
Equipment for surface analysis:
- Chemical: Spectroscopies (XPS, Auger, ARPES)
- Physical: Magneto-optical Kerr effect; Spectroscopies; Photo- and Cathodo-luminescence
- Structural: Electron diffraction (RHEED, LEED); Microscopies (STM, AFM, SEM)
Examples of achievements
The research topics currently developed on the platform cover the following areas:
- Materials for spintronic: ferromagnetic, magnetic oxides, strong spin orbit coupling, topological effect, etc.
- Nanomaterials for optoelectronics, photovoltaics, etc.
- 2D materials: molecular, ultra-thin oxides, etc.
- Complex alloys and quasi crystals
- Functional materials: ternary oxides, Heusler alloys, etc.
Some significant publications involving CC D.A.U.M. members:
- Local Structure and Point-Defect-Dependent area-selective atomic layer deposition approach for facile synthesis of p-Cu2O/n-ZnO segmented nano-junctions, C. De Melo, M. Jullien, J. Ghanbaja, F. Montaigne, J.-F. Pierson, F. Soldera, F. Rigoni, N. Almqvist, A. Vomiero, F. Mücklich, D. Horwat, ACS Applied Materials & Interfaces 2018, 10, 37671-37678
- Formation of SiP2 nanocrystals embedded in SiO2 from Phosphorus-Rich SiO1.5 hin films, S. Geiskopf, M. Stoffel, X. Devaux, E. André, C. Carteret, A. Bouché, M. Vergnat, H. Rinnert, J. Phys. Chem. C 2020, 124, 14, 7973-7978
- Ultra-low magnetic damping in Co2Mn- based Heusler compounds: promising materials for spintronic, C. Guillemard, S. Petit-Watelot, L. Pasquier , D. Pierre, C. Rojas-Sanchez, A. Bataille, J. Rault, P. Le Fevre, F. Bertran , S. Andrieu, Phys. Rev. Applied 11, 064009 (2019)
Our services
D.A.U.M. puts its technical and scientific skills at your disposal and offers you:
- tailor-made training in thin films deposition and characterization under vacuum conditions
- research collaborations
- engineering solutions to your industrial R&D issues
Members
Technical staff
- Alexandre BOUCHE
- Maoxiang ZHU
- Ludovic PASQUIER
- Danielle PIERRE
- David PILLOUD
Contract researcher
Contact
Head of the competence center
Danielle PIERRE
danielle.pierre@univ-lorraine.fr
Tél. : + 33 (0) 3 72 74 24 27 / + 33 (0) 3 72 74 25 68
Adminsitrative contact
Pascal THIS
pascal.this@univ-lorraine.fr
+ 33 (0)3 72 74 25 02
Nancy-Artem
Institut Jean Lamour
Campus Artem
2 allée André Guinier - BP 50840
54011 NANCY Cedex