Deposition and characterization of thin films under ultra-high vacuum (D.A.U.M. Tube)

You needs

• Produce devices in the form of thin layers
• Elaboration of a single layer or multilayer thin films using different techniques like PVD or ALD while remaining under ultra-high-vacuum
• Characterize your thin layers (STM, AFM, XPS, Auger)
• Take advantage of the machine park at your disposal
• You can also connect your deposit chamber to the TTO part of the D.A.U.M. Tube, giving you access to its characterization tools.

Our solutions

While remaining in the field of ultra-high-vacuum you have access to:

• 8 thin film processing systems specialized acording to the type of material: MBE, Thermal Evaporators, CVD, Cathodic Sputtering, Laser Ablation
• 8 analysis and characterization systems: Surface (RHEED, STM, AFM), Chemical (Auger Spectroscopy, XPS, UPS), Properties (Kerr Effect, Ellipsometry)
• 2 functional systems: Ion etching, annealing under field conditions
   

Keywords

• D.A.U.M.
• PVD
• ALD
• PLD
• Evaporation
• Ultra high vaccum
• SEM
• Thin films
• XPS
• AFM
• STM

Related skills

• Study of semiconductor or dielectric thin films
• Micro and nanofabrication processes
• Probe, control and functionalize the magnetism of matter
• Thermal and optical regulation of thin films (thermochromics) 
• Electron microscopy
• X-ray diffraction 
• Epitaxy 
• Monolayer 

Our references

• Viessmann
• Nipson Technology

Contact

• Contact the research group:
  danielle.pierre@univ-lorraine.fr
  +33 (0) 3 72 74 25 68
  +33 (0) 3 72 74 24 27
   
• Contact the technology transfer office (TTO):
  ijl-tto@univ-lorraine.fr
  +33 (0) 3 72 74 26 04